Contact-aided compliant mechanisms (CCMs) are synthesized via the material mask overlay strategy (MMOS) to trace desired nonsmooth paths. MMOS employs hexagonal cells to discretize the design region and engages negative circular masks to designate material states. To synthesize CCMs, the modified MMOS presented herein involves systematic mutation of five mask parameters through a hill climber search to evolve not only the continuum topology but also to position the rigid, interacting surfaces within some masks. To facilitate analysis with contact, boundary smoothing is performed by shifting boundary nodes of the evolving continuum. Various geometric singularities are subdued via hexagonal cells, and the V-notches at the continuum boundaries are alleviated. Numerous hexagonal cells get morphed into concave subregions as a consequence. Large deformation finite-element formulation with mean-value coordinates based shape functions is used to cater to the generic hexagonal shapes. Contact analysis is accomplished via the Newton–Raphson (NR) iteration with load incrementing in conjunction with the augmented Lagrange multiplier method and active set constraints. An objective function based on Fourier shape descriptors (FSDs) is minimized subject to suitable design constraints. Two examples of path-generating CCMs are presented, their performance compared with a commercial software and fabricated to establish the efficacy of the proposed synthesis method.
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June 2016
Research-Article
Synthesis of C0 Path-Generating Contact-Aided Compliant Mechanisms Using the Material Mask Overlay Method
Prabhat Kumar,
Prabhat Kumar
Mechanical Engineering,
Indian Institute of Technology Kanpur,
Kanpur 208016, India
e-mail: kprabhat@iitk.ac.in
Indian Institute of Technology Kanpur,
Kanpur 208016, India
e-mail: kprabhat@iitk.ac.in
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Roger A. Sauer,
Roger A. Sauer
Mechanical Engineering,
AICES, RWTH Aachen University,
Schinkelstrasse 2,
Aachen 52056, Germany
e-mail: sauer@aices.rwth-aachen.de
AICES, RWTH Aachen University,
Schinkelstrasse 2,
Aachen 52056, Germany
e-mail: sauer@aices.rwth-aachen.de
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Anupam Saxena
Anupam Saxena
Mechanical Engineering,
Indian Institute of Technology Kanpur,
Kanpur 208016, India
e-mail: anupams@iitk.ac.in
Indian Institute of Technology Kanpur,
Kanpur 208016, India
e-mail: anupams@iitk.ac.in
Search for other works by this author on:
Prabhat Kumar
Mechanical Engineering,
Indian Institute of Technology Kanpur,
Kanpur 208016, India
e-mail: kprabhat@iitk.ac.in
Indian Institute of Technology Kanpur,
Kanpur 208016, India
e-mail: kprabhat@iitk.ac.in
Roger A. Sauer
Mechanical Engineering,
AICES, RWTH Aachen University,
Schinkelstrasse 2,
Aachen 52056, Germany
e-mail: sauer@aices.rwth-aachen.de
AICES, RWTH Aachen University,
Schinkelstrasse 2,
Aachen 52056, Germany
e-mail: sauer@aices.rwth-aachen.de
Anupam Saxena
Mechanical Engineering,
Indian Institute of Technology Kanpur,
Kanpur 208016, India
e-mail: anupams@iitk.ac.in
Indian Institute of Technology Kanpur,
Kanpur 208016, India
e-mail: anupams@iitk.ac.in
1Corresponding author.
2A small positive ϵ is chosen to circumvent singularity in the stiffness matrix during the finite-element analysis.
Contributed by the Mechanisms and Robotics Committee of ASME for publication in the JOURNAL OF MECHANICAL DESIGN. Manuscript received July 11, 2015; final manuscript received April 8, 2016; published online April 27, 2016. Assoc. Editor: Charles Kim.
J. Mech. Des. Jun 2016, 138(6): 062301 (9 pages)
Published Online: April 27, 2016
Article history
Received:
July 11, 2015
Revised:
April 8, 2016
Citation
Kumar, P., Sauer, R. A., and Saxena, A. (April 27, 2016). "Synthesis of C0 Path-Generating Contact-Aided Compliant Mechanisms Using the Material Mask Overlay Method." ASME. J. Mech. Des. June 2016; 138(6): 062301. https://doi.org/10.1115/1.4033393
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