...) 1.052 0.050 10.691 0.014 0.309 This article explores a novel chemo-mechanical polishing slurry incorporating PEG, AE, SiO 2 abrasives, KOH, DW, and GO is investigated for achieving an atomic-scale surface on KDP crystals. The study delves into the material removal mechanism of the slurry...

...%. The material removal mechanism is more uniform and directed in the submerged milling, whereas in-air is random. The proposed model predicted the kerf cross-sectional profile in submerged milling and in-air with a mean absolute error of 60 µm and 57 µm, squared Pearson correlation coefficient of 0.97 and 0.99...

... is capable of predicting the machining results within 10% deviation. VANILA nanomachining material removal mechanism abrasive machining MRR Scanning probe microscopy (SPM) methods, such as scanning–tunneling microscopy (STM) and AFM are one of the most prominent techniques in conducting...