The thickness and curvature profiles in the contact line region of a moving evaporating thin liquid film of pentane on a quartz substrate were measured for the thickness region, δ<2.5 μm. The critical region, δ<0.1 μm, was emphasized. The profiles were obtained using image-analyzing interferometry and an improved data analysis procedure. The precursor adsorbed film, the thickness, the curvature, and interfacial slope (variation of the local “apparent contact angle”) profiles were consistent with previous models based on interfacial concepts. Isothermal equilibrium conditions were used to verify the accuracy of the procedures and to evaluate the retarded dispersion constant in situ. The profiles give fundamental insight into the phenomena of phase change, pressure gradient, fluid flow, spreading, shear stress, and the physics of interfacial phenomena in the contact line region. The experimental results demonstrate explicitly, for the first time with microscopic detail, that the disjoining pressure controls fluid flow within an evaporating completely wetting thin curved film.
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Experimental Determination of the Effect of Disjoining Pressure on Shear in the Contact Line Region of a Moving Evaporating Thin Film
Sashidhar S. Panchamgam,
Sashidhar S. Panchamgam
The Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180
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Shripad J. Gokhale,
Shripad J. Gokhale
The Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180
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Joel L. Plawsky,
Joel L. Plawsky
The Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180
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Sunando DasGupta,
Sunando DasGupta
Department of Chemical Engineering, Indian Institute of Technology, Kharagpur, PIN—721302, India
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Peter C. Wayner,, Jr.
Peter C. Wayner,, Jr.
The Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180
11
Search for other works by this author on:
Sashidhar S. Panchamgam
The Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180
Shripad J. Gokhale
The Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180
Joel L. Plawsky
The Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180
Sunando DasGupta
Department of Chemical Engineering, Indian Institute of Technology, Kharagpur, PIN—721302, India
Peter C. Wayner,, Jr.
11
The Isermann Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180
Manuscript received March 1, 2004; revision received September 10, 2004. Review conducted by: J. H. Lienhard V.
J. Heat Transfer. Mar 2005, 127(3): 231-243 (13 pages)
Published Online: March 24, 2005
Article history
Received:
March 1, 2004
Revised:
September 10, 2004
Online:
March 24, 2005
Citation
Panchamgam , S. S., Gokhale , S. J., Plawsky, J. L., DasGupta, S., and Wayner, , P. C., Jr. (March 24, 2005). "Experimental Determination of the Effect of Disjoining Pressure on Shear in the Contact Line Region of a Moving Evaporating Thin Film." ASME. J. Heat Transfer. March 2005; 127(3): 231–243. https://doi.org/10.1115/1.1857947
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